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Current Cool Picture
 
Defects Observation in Al2O3 wafer with White Beam X-ray Diffraction Topography
Intoduction
Using a scintillator-CCD imaging system, we successfully conducted a synchrotron white beam X-ray Diffraction Topography experiment. Optimum condition for high-resolution imaging is obtainable from the incident angle dependence of geometrical resolution.
Some pictures of our experiments

White Beam X-ray Diffraction Topograph showing defect distribution in Al2O3 wafer
The surface defect structure of Al2O3 (11-20) wafer clearly reveals surface scratches (wavy images marked by the white arrow) and the bubbles structure (the black arrow).
 
 
Pohang University of Science & Techology San 31, Hyojadong, Pohang 790-784, Republic of Korea   
 
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