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Current Cool Picture
 
Metallic Micro Hollow Tube
Intoduction
We describe a technique to fabricate three-dimensional (3D), freestanding metallic micro hollow tubes by template-free localized electrochemical deposition. The features of the grown structure are controlled by the field strength distribution in its proximity that depends on the applied voltage and the microelectrode-structure distance (L). The formation of micro hollow tubes is induced by the enhanced electric field at the microelectrode rim for small L values (a few micrometers or less) and high applied voltages.
Some pictures of our experiments

We fabricate a freestanding Cu micro hollow tube by Localized Electrochemical Deposition (LECD)
LECD growth of well-defined hollow tube. Top: FE-SEM images and (inset) tomographic slices of the grown structures. Bottom: real-time images of the LECD process by coherent X-ray microradiography. The images show (a) a dense wire obtained at 4.5 V in the no-contact growth mode; (b) a porous wire obtained at 4.5 V in the contact growth mode; and (c) a well-defined hollow tube obtained at 10.0 V, again in the contact growth mode. The contrast difference in (c) between the inner (lack arrow) and outer (white arrow) regions in the radiographic image reveals the formation of a hollow tube.
 
 
Pohang University of Science & Techology San 31, Hyojadong, Pohang 790-784, Republic of Korea   
 
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